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Si-on-金剛石品牌
青禾晶元產(chǎn)地
北京樣本
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Si-on-金剛石
基于鍵合技術(shù)實(shí)現(xiàn)了金剛石基硅復(fù)合襯底,有望解決高功率密度硅器件散熱能力不足的難題
Based on the bonding technology, Si-on-diamond substrate has been realized, which is expected to solve the problem of insufficient heat dissipation of Si devices with high power density.
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