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一、制備方法：無(wú)壓燒結(jié)法
Fabrication: Pressureless Sintering
ITO靶材以磁控濺射等方式用于導(dǎo)電玻璃的制備。ITO膜具有導(dǎo)電性以及對(duì)可見(jiàn)光的透明性和對(duì)紅外線的反射性三個(gè)特性，廣泛用于顯示屏、玻璃幕墻、太陽(yáng)能電池、雷達(dá)屏蔽、冰柜、防霧玻璃等產(chǎn)品，尤以顯示屏為大宗。
ITO (indium tin oxide) target is used to make conductive glass with
technologies such as magnetron sputtering. With such valuable properties
as good electric conductivity, excellent transparency for visible light
and high reflectivity for infrared ray, ITO film is widely used in
display panels (major application), glass screens, solar cells, radar
shields, freezer boxes, fog-proof windshields, among others.
三、技術(shù)指標(biāo)：Specifications
|
性能 Properties |
單位Unit |
標(biāo)準(zhǔn)值Standard Value |
|
|
化學(xué)成分 Chemical composition |
wt% |
In2O3:SnO2=90:10 Others are subject to the requirements of the customers |
|
|
**規(guī)格Maximum Size |
mm |
1150×380×(6.0-10) |
|
|
相對(duì)密度Relative Density |
--- |
≥99.8% |
|
|
理論密度Theoretical density |
g/cm3 |
7.156 |
|
|
體積電阻率Volume Resistivity |
Ω·cm |
1.6×10-4 |
|
|
抗彎強(qiáng)度Bending Strength |
MPa |
>150 |
|
|
純度purity |
--- |
≥99.99% |
|
|
失氧率Oxygen loss rate |
--- |
≤0.5% |
一、 ICP雜質(zhì)檢測(cè)
|
雜質(zhì)元素 |
含量(ppm) |
|
Si |
12 |
|
Fe |
1.5 |
|
Ca |
<5.0 |
|
Na |
2.0 |
|
Cu |
1.1 |
|
Cd |
<1.0 |
|
Pb |
<1.0 |
暫無(wú)數(shù)據(jù)！
ITO平面靶材的工作原理介紹？ITO平面靶材的使用方法？ITO平面靶材多少錢一臺(tái)？ITO平面靶材使用的注意事項(xiàng)ITO平面靶材的說(shuō)明書有嗎？ITO平面靶材的操作規(guī)程有嗎？ITO平面靶材的報(bào)價(jià)含票含運(yùn)費(fèi)嗎？ITO平面靶材有現(xiàn)貨嗎？ITO平面靶材包安裝嗎？
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